Struct PositionedGlyph 

pub struct PositionedGlyph {
    pub gid: u16,
    pub font_data: Arc<[u8]>,
    pub pos: (f32, f32),
    pub font_size: f32,
    pub advance_x: f32,
    pub cluster: u32,
}

A glyph positioned on the layout canvas.

Fields

gid: u16

Glyph ID.

font_data: Arc<[u8]>

Font data associated with this glyph.

pos: (f32, f32)

Position (x, y) in pixels from the top-left origin.

font_size: f32

Font size in pixels-per-em used to shape and rasterise this glyph.

Carried per-glyph so that a single line may mix multiple sizes (e.g. superscripts, mixed-style runs) and the rasteriser knows the size for each glyph without re-deriving it from a shared style.

advance_x: f32

Horizontal advance in pixels (same unit as pos).

Needed for hit-testing (cursor placement) and for determining a glyph’s x-extent without referencing the original ShapedRun again.

cluster: u32

UTF-8 byte offset of this glyph’s cluster in the source text.

Mirrors ShapedGlyph::cluster. Carried here so that hit-testing, hanging-punctuation checks, and other post-layout passes can identify the source codepoint without walking the original ShapedRun list.

Trait Implementations

impl Clone for PositionedGlyph

fn clone(&self) -> PositionedGlyph

Returns a duplicate of the value.

fn clone_from(&mut self, source: &Self)

Performs copy-assignment from source.

impl Debug for PositionedGlyph

fn fmt(&self, f: &mut Formatter<'_>) -> Result

Formats the value using the given formatter.