Enum Cmd 

#[non_exhaustive]
pub enum Cmd {
    Rect {
        x: i32,
        y: i32,
        w: i32,
        h: i32,
        c: u32,
    },
    RRect {
        x: i32,
        y: i32,
        w: i32,
        h: i32,
        r: u16,
        t: u16,
        fill: u32,
        stroke: u32,
        stroke2: u32,
    },
    PanelFx {
        x: i32,
        y: i32,
        w: i32,
        h: i32,
        r: i32,
        t: i32,
        fill: u32,
        stroke: u32,
    },
    Text {
        x: i32,
        y: i32,
        font: u16,
        size: i32,
        c: u32,
        maxw: i32,
        s: Vec<u8>,
    },
    Icon {
        x: i32,
        y: i32,
        cp: u32,
        size: i32,
        c: u32,
    },
    Image {
        x: i32,
        y: i32,
        w: i32,
        h: i32,
        sf: Rc<Surface>,
        ver: u32,
    },
    Clip {
        x: i32,
        y: i32,
        w: i32,
        h: i32,
    },
    Unclip,
    Circle {
        x: i32,
        y: i32,
        r: i32,
        t: i32,
        c: u32,
    },
    Line {
        x0: i32,
        y0: i32,
        x1: i32,
        y1: i32,
        w: i32,
        c: u32,
    },
    Custom {
        x: i32,
        y: i32,
        w: i32,
        h: i32,
        f: Option<DrawRef>,
        user: usize,
        ver: u32,
    },
    Shadow {
        x: i32,
        y: i32,
        w: i32,
        h: i32,
        r: i32,
        depth: i32,
        c: u32,
    },
}

one recorded draw command [C_*]

Variants (Non-exhaustive)

Non-exhaustive enums could have additional variants added in future. Therefore, when matching against variants of non-exhaustive enums, an extra wildcard arm must be added to account for any future variants.

Rect

Fields

x: i32

y: i32

w: i32

h: i32

c: u32

RRect

fill (alpha 0 = none), border t px in stroke, its bottom band in stroke2; r and t are kept as u16

Fields

x: i32

y: i32

w: i32

h: i32

r: u16

t: u16

fill: u32

stroke: u32

stroke2: u32

PanelFx

Fractional rounded panel; geometry is 24.8 pixels and composited once.

Fields

x: i32

y: i32

w: i32

h: i32

r: i32

t: i32

fill: u32

stroke: u32

Text

text with baseline y; maxw != 0 clips it to x .. x + maxw

Fields

x: i32

y: i32

font: u16

size: i32

c: u32

maxw: i32

s: Vec<u8>

Icon

icon, em box top-left at x, y

Fields

x: i32

y: i32

cp: u32

size: i32

c: u32

Image

Fields

x: i32

y: i32

w: i32

h: i32

sf: Rc<Surface>

ver: u32

Clip

Fields

x: i32

y: i32

w: i32

h: i32

Unclip

Circle

24.8; t = 0 fills

Fields

x: i32

y: i32

r: i32

t: i32

c: u32

Line

24.8, round caps

Fields

x0: i32

y0: i32

x1: i32

y1: i32

w: i32

c: u32

Custom

Fields

x: i32

y: i32

w: i32

h: i32

f: Option<DrawRef>

user: usize

ver: u32

Shadow

Fields

x: i32

y: i32

w: i32

h: i32

r: i32

depth: i32

c: u32

Trait Implementations

impl Clone for Cmd

fn clone(&self) -> Self

Returns a duplicate of the value.

fn clone_from(&mut self, source: &Self)

Performs copy-assignment from source.