#![allow(
clippy::approx_constant,
clippy::useless_vec,
clippy::len_zero,
clippy::unnecessary_cast,
clippy::redundant_closure,
clippy::too_many_arguments,
clippy::type_complexity,
clippy::needless_borrow,
clippy::enum_variant_names,
clippy::upper_case_acronyms,
clippy::inconsistent_digit_grouping,
clippy::unit_cmp,
clippy::assertions_on_constants,
clippy::iter_on_single_items,
clippy::expect_fun_call,
clippy::redundant_pattern_matching,
variant_size_differences,
clippy::absurd_extreme_comparisons,
clippy::nonminimal_bool,
clippy::for_kv_map,
clippy::needless_range_loop,
clippy::single_match,
clippy::collapsible_if,
clippy::needless_return,
clippy::redundant_clone,
clippy::map_entry,
clippy::match_single_binding,
clippy::bool_comparison,
clippy::derivable_impls,
clippy::manual_range_contains,
clippy::needless_borrows_for_generic_args,
clippy::manual_map,
clippy::vec_init_then_push,
clippy::identity_op,
clippy::manual_flatten,
clippy::single_char_pattern,
clippy::search_is_some,
clippy::option_map_unit_fn,
clippy::while_let_on_iterator,
clippy::clone_on_copy,
clippy::box_collection,
clippy::redundant_field_names,
clippy::ptr_arg,
clippy::large_enum_variant,
clippy::match_ref_pats,
clippy::needless_pass_by_value,
clippy::unused_unit,
clippy::let_and_return,
clippy::suspicious_else_formatting,
clippy::manual_strip,
clippy::match_like_matches_macro,
clippy::from_over_into,
clippy::wrong_self_convention,
clippy::inherent_to_string,
clippy::new_without_default,
clippy::unnecessary_wraps,
clippy::field_reassign_with_default,
clippy::manual_find,
clippy::unnecessary_lazy_evaluations,
clippy::should_implement_trait,
clippy::missing_safety_doc,
clippy::unusual_byte_groupings,
clippy::bool_assert_comparison,
clippy::zero_prefixed_literal,
clippy::await_holding_lock,
clippy::manual_saturating_arithmetic,
clippy::explicit_counter_loop,
clippy::needless_lifetimes,
clippy::single_component_path_imports,
clippy::uninlined_format_args,
clippy::iter_cloned_collect,
clippy::manual_str_repeat,
clippy::excessive_precision,
clippy::precedence,
clippy::unnecessary_literal_unwrap
)]
use oxicode::{decode_from_slice, encode_to_vec, Decode, Encode};
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct DieCoordinate {
row: u16,
col: u16,
site: u8,
}
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct WaferIdentifier {
wafer_number: u8,
slot: u8,
orientation_notch_deg: f32,
die_grid: Vec<DieCoordinate>,
}
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct LotInfo {
lot_id: String,
product_code: String,
technology_node_nm: u16,
wafer_count: u8,
priority: u8,
}
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct WaferLot {
lot: LotInfo,
wafers: Vec<WaferIdentifier>,
route_id: String,
current_step: u32,
total_steps: u32,
}
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct OverlayError {
x_offset_nm: f64,
y_offset_nm: f64,
rotation_urad: f64,
magnification_ppm: f64,
}
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct ExposureSettings {
dose_mj_per_cm2: f64,
focus_offset_nm: f64,
numerical_aperture: f64,
sigma_inner: f64,
sigma_outer: f64,
wavelength_nm: f64,
}
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct ReticleInfo {
reticle_id: String,
layer_name: String,
field_size_x_mm: f64,
field_size_y_mm: f64,
pellicle_attached: bool,
}
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct LithoStep {
step_name: String,
tool_id: String,
reticle: ReticleInfo,
exposure: ExposureSettings,
overlay: OverlayError,
alignment_marks_used: u8,
}
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct GasFlow {
gas_name: String,
flow_sccm: f64,
mfc_channel: u8,
}
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct RfSource {
frequency_mhz: f64,
power_watts: f64,
pulsed: bool,
duty_cycle_pct: f64,
}
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct EtchStep {
step_label: String,
duration_sec: f64,
pressure_mtorr: f64,
temperature_c: f64,
gases: Vec<GasFlow>,
source_rf: RfSource,
bias_rf: RfSource,
endpoint_signal: Option<String>,
}
#[derive(Debug, PartialEq, Clone, Encode, Decode)]
struct EtchRecipe {
recipe_id: String,
chamber_id: String,
steps: Vec<EtchStep>,
total_time_sec: f64,
}
#[test]
fn test_wafer_lot_tracking() {
let lot = WaferLot {
lot: LotInfo {
lot_id: "N7-2026-0315-A".into(),
product_code: "APEX7".into(),
technology_node_nm: 7,
wafer_count: 25,
priority: 1,
},
wafers: vec![
WaferIdentifier {
wafer_number: 1,
slot: 1,
orientation_notch_deg: 0.0,
die_grid: vec![
DieCoordinate {
row: 0,
col: 0,
site: 1,
},
DieCoordinate {
row: 0,
col: 1,
site: 1,
},
DieCoordinate {
row: 1,
col: 0,
site: 1,
},
],
},
WaferIdentifier {
wafer_number: 2,
slot: 2,
orientation_notch_deg: 0.0,
die_grid: vec![
DieCoordinate {
row: 0,
col: 0,
site: 1,
},
DieCoordinate {
row: 0,
col: 1,
site: 2,
},
],
},
],
route_id: "ROUTE-N7-LOGIC-V3".into(),
current_step: 42,
total_steps: 320,
};
let encoded = encode_to_vec(&lot).expect("encode wafer lot");
let (decoded, _): (WaferLot, _) = decode_from_slice(&encoded).expect("decode wafer lot");
assert_eq!(lot, decoded);
}
#[test]
fn test_photolithography_full_step() {
let litho = LithoStep {
step_name: "M1_PHOTO".into(),
tool_id: "ASML-NXT2000-01".into(),
reticle: ReticleInfo {
reticle_id: "RTL-M1-V2R3".into(),
layer_name: "METAL1".into(),
field_size_x_mm: 26.0,
field_size_y_mm: 33.0,
pellicle_attached: true,
},
exposure: ExposureSettings {
dose_mj_per_cm2: 30.5,
focus_offset_nm: -10.0,
numerical_aperture: 0.33,
sigma_inner: 0.6,
sigma_outer: 0.9,
wavelength_nm: 13.5,
},
overlay: OverlayError {
x_offset_nm: 0.8,
y_offset_nm: -0.3,
rotation_urad: 0.12,
magnification_ppm: 0.05,
},
alignment_marks_used: 8,
};
let encoded = encode_to_vec(&litho).expect("encode litho step");
let (decoded, _): (LithoStep, _) = decode_from_slice(&encoded).expect("decode litho step");
assert_eq!(litho, decoded);
}
#[test]
fn test_etch_recipe_multi_step() {
let recipe = EtchRecipe {
recipe_id: "ETCH-POLY-HK-V4".into(),
chamber_id: "LAM-KIYO-C3".into(),
steps: vec![
EtchStep {
step_label: "Breakthrough".into(),
duration_sec: 5.0,
pressure_mtorr: 4.0,
temperature_c: 60.0,
gases: vec![
GasFlow {
gas_name: "Cl2".into(),
flow_sccm: 100.0,
mfc_channel: 1,
},
GasFlow {
gas_name: "BCl3".into(),
flow_sccm: 50.0,
mfc_channel: 2,
},
],
source_rf: RfSource {
frequency_mhz: 60.0,
power_watts: 800.0,
pulsed: false,
duty_cycle_pct: 100.0,
},
bias_rf: RfSource {
frequency_mhz: 13.56,
power_watts: 50.0,
pulsed: true,
duty_cycle_pct: 30.0,
},
endpoint_signal: None,
},
EtchStep {
step_label: "Main Etch".into(),
duration_sec: 45.0,
pressure_mtorr: 8.0,
temperature_c: 55.0,
gases: vec![
GasFlow {
gas_name: "HBr".into(),
flow_sccm: 200.0,
mfc_channel: 3,
},
GasFlow {
gas_name: "O2".into(),
flow_sccm: 5.0,
mfc_channel: 4,
},
GasFlow {
gas_name: "He".into(),
flow_sccm: 300.0,
mfc_channel: 5,
},
],
source_rf: RfSource {
frequency_mhz: 60.0,
power_watts: 400.0,
pulsed: true,
duty_cycle_pct: 50.0,
},
bias_rf: RfSource {
frequency_mhz: 13.56,
power_watts: 120.0,
pulsed: true,
duty_cycle_pct: 40.0,
},
endpoint_signal: Some("OES-Br-827nm".into()),
},
EtchStep {
step_label: "Over Etch".into(),
duration_sec: 15.0,
pressure_mtorr: 12.0,
temperature_c: 55.0,
gases: vec![
GasFlow {
gas_name: "HBr".into(),
flow_sccm: 150.0,
mfc_channel: 3,
},
GasFlow {
gas_name: "O2".into(),
flow_sccm: 10.0,
mfc_channel: 4,
},
],
source_rf: RfSource {
frequency_mhz: 60.0,
power_watts: 200.0,
pulsed: false,
duty_cycle_pct: 100.0,
},
bias_rf: RfSource {
frequency_mhz: 13.56,
power_watts: 30.0,
pulsed: false,
duty_cycle_pct: 100.0,
},
endpoint_signal: None,
},
],
total_time_sec: 65.0,
};
let encoded = encode_to_vec(&recipe).expect("encode etch recipe");
let (decoded, _): (EtchRecipe, _) = decode_from_slice(&encoded).expect("decode etch recipe");
assert_eq!(recipe, decoded);
}
#[test]
fn test_overlay_tight_tolerance() {
let litho = LithoStep {
step_name: "VIA1_PHOTO".into(),
tool_id: "ASML-NXE3400-02".into(),
reticle: ReticleInfo {
reticle_id: "RTL-V1-V1R1".into(),
layer_name: "VIA1".into(),
field_size_x_mm: 26.0,
field_size_y_mm: 33.0,
pellicle_attached: true,
},
exposure: ExposureSettings {
dose_mj_per_cm2: 33.0,
focus_offset_nm: -5.0,
numerical_aperture: 0.33,
sigma_inner: 0.5,
sigma_outer: 0.85,
wavelength_nm: 13.5,
},
overlay: OverlayError {
x_offset_nm: 0.15,
y_offset_nm: -0.08,
rotation_urad: 0.02,
magnification_ppm: 0.01,
},
alignment_marks_used: 16,
};
let encoded = encode_to_vec(&litho).expect("encode overlay litho");
let (decoded, _): (LithoStep, _) = decode_from_slice(&encoded).expect("decode overlay litho");
assert_eq!(litho, decoded);
}